Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA)
Nanoimprint lithography is a method of fabricating nanometer scale patterns. These nanometer scale patterns are fabricated through replication of negative patterned imprint mold. In this Final Year Project, low mo...
| Hlavní autor: | |
|---|---|
| Další autoři: | |
| Médium: | Final Year Project (FYP) |
| Jazyk: | English |
| Vydáno: |
2013
|
| Témata: | |
| On-line přístup: | http://hdl.handle.net/10356/53255 |