Optimisation of stamp compliance for nanoimprint lithography : an experimental and simulation investigation of deformation of Polydimethylsiloxane (PDMS) and Ultraviolet Curable Polyuerthane Acrylate (UV-PUA)
Nanoimprint lithography is a method of fabricating nanometer scale patterns. These nanometer scale patterns are fabricated through replication of negative patterned imprint mold. In this Final Year Project, low mo...
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| Format: | Final Year Project (FYP) |
| Language: | English |
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2013
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| Online Access: | http://hdl.handle.net/10356/53255 |