Process development for PECVD equipment
Process for depositing silicon nitride film by using Micro-90011 PECVD system has been developed. The stress test structure simulation, fabrication and system performance improvement have been studied in the project. The studies are carried out stress measurements at a device level by using micromac...
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| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/5448 |