Advanced CMOS technologies (high-k/metal gate stacks) for sub-22nm node
A thermally grown silicon dioxide (SiO2), which forms the insulating layer in the metal-oxide-semiconductor field effect transistor (MOSFET), is considered as the heart of a MOSFET. It has been essential for the microelectronics revolution due to the following outstanding properties: high resistivit...
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| Format: | Thesis |
| Language: | English |
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2013
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| Online Access: | https://hdl.handle.net/10356/54848 |