Growth and characterization of AlGaN/GaN HEMT heterostructures on 100-mm Si (111) by MBE
III-nitride semiconductors have received significant research attention and undergone immense development due to their widely found applications in microelectronic and optoelectronic devices. Among them, GaN based materials promise great potential for high frequency, high power, and high temperature...
Main Author: | Manvi Agrawal |
---|---|
Other Authors: | K. Radhakrishnan |
Format: | Thesis |
Language: | English |
Published: |
2013
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/54999 |
Similar Items
-
Ga-bilayer controlled AlGaN/GaN HEMT structure grown on Si by PA-MBE
by: Agrawal, M., et al.
Published: (2011) -
AlGaN/GaN two-dimensional-electron gas heterostructures on 200 mm diameter Si(111)
by: Dolmanan, S. B., et al.
Published: (2013) -
Structural properties of GaN grown on AlGaN/AlN stress mitigating layers on 100-mm Si (111) by ammonia molecular beam epitaxy
by: Agrawal, M., et al.
Published: (2013) -
The temperature dependent TCAD and SPICE modeling of AlGaN/GaN HEMTs
by: Yuan, Li, et al.
Published: (2013) -
Characterization and analysis of AlGaN/GaN HEMTs on Si for high frequency application
by: Pang, Vanessa Du Juan
Published: (2017)