Fabrication of very high aspect micromold by SU-8 photolithography and electroforming

Microstructures with very high aspect ratio (VHAR) have diverse applications because the increased surface area leads to increased volume handling and sensitivity desired for many MicroElectro Systems (MEMS).

Xehetasun bibliografikoak
Egile nagusia: Zhang, Jun
Beste egile batzuk: Chan Bee Eng, Mary
Formatua: Thesis
Argitaratua: 2008
Gaiak:
Sarrera elektronikoa:https://hdl.handle.net/10356/5524