Fabrication of very high aspect micromold by SU-8 photolithography and electroforming
Microstructures with very high aspect ratio (VHAR) have diverse applications because the increased surface area leads to increased volume handling and sensitivity desired for many MicroElectro Systems (MEMS).
Main Author: | Zhang, Jun |
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Other Authors: | Chan Bee Eng, Mary |
Format: | Thesis |
Published: |
2008
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/5524 |
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