Development of photo-resist application process using pre-wet technique

This project studies the application of edge bead remover (EBR) chemical as a pre-wet before dispensing the photo-resist on to the wafer.

Bibliographic Details
Main Author:	Anup Ramachandran
Other Authors:	Zhao, Yong
Format:	Thesis
Published:	2008
Subjects:	DRNTU::Engineering::Manufacturing
Online Access:	http://hdl.handle.net/10356/5873

Internet

http://hdl.handle.net/10356/5873