Stress evaluation in thin films
We are in the midst of a major technology transition from alumni to copper as the metallization material. In the present study, a comprehensive examination of the change in the stress state due to this technology transition has been made, which is done by repeating the experiments that were done on...
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| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/5925 |
| _version_ | 1826128616292876288 |
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| author | Lalita Varma P. V. S. N. |
| author2 | Ramamurthy, Upadrasta |
| author_facet | Ramamurthy, Upadrasta Lalita Varma P. V. S. N. |
| author_sort | Lalita Varma P. V. S. N. |
| collection | NTU |
| description | We are in the midst of a major technology transition from alumni to copper as the metallization material. In the present study, a comprehensive examination of the change in the stress state due to this technology transition has been made, which is done by repeating the experiments that were done on aluminium and comparing the results when the same tests were done on copper. |
| first_indexed | 2024-10-01T07:27:49Z |
| format | Thesis |
| id | ntu-10356/5925 |
| institution | Nanyang Technological University |
| last_indexed | 2024-10-01T07:27:49Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/59252023-03-11T17:00:49Z Stress evaluation in thin films Lalita Varma P. V. S. N. Ramamurthy, Upadrasta School of Mechanical and Production Engineering DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films We are in the midst of a major technology transition from alumni to copper as the metallization material. In the present study, a comprehensive examination of the change in the stress state due to this technology transition has been made, which is done by repeating the experiments that were done on aluminium and comparing the results when the same tests were done on copper. Master of Engineering (MPE) 2008-09-17T11:02:31Z 2008-09-17T11:02:31Z 2001 2001 Thesis http://hdl.handle.net/10356/5925 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films Lalita Varma P. V. S. N. Stress evaluation in thin films |
| title | Stress evaluation in thin films |
| title_full | Stress evaluation in thin films |
| title_fullStr | Stress evaluation in thin films |
| title_full_unstemmed | Stress evaluation in thin films |
| title_short | Stress evaluation in thin films |
| title_sort | stress evaluation in thin films |
| topic | DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films |
| url | http://hdl.handle.net/10356/5925 |
| work_keys_str_mv | AT lalitavarmapvsn stressevaluationinthinfilms |