Optimization and application of Epon SU-8, an ultra-thick negative photoresist
Another application that requires ultra-thick photoresist films is micromachining in MEMS. Extremely large structure heights are frequently required for micro-electrodeposition of mechanical components such as coils, cantilevers and valves. These applications may require photoresist in excess of a h...
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| Format: | Thesis |
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2008
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| Online Access: | http://hdl.handle.net/10356/6465 |