Application of fast laser deprocessing techniques in the field of semiconductor manufacturing

With technology scaling of semiconductor devices and further growth of the integrated circuit (IC) design and function complexity, it is necessary to increase the number of transistors in IC chip, layer stack, and process steps. The last few metal layers of Back End Of Line (BEOL) are usually very t...

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Bibliografske podrobnosti
Glavni avtor: Zhao, Yuzhe
Drugi avtorji: Wang Qijie
Format: Final Year Project (FYP)
Jezik:English
Izdano: 2016
Teme:
Online dostop:http://hdl.handle.net/10356/69302