Design evaluation of microelectronics devices using focused ion beam technology
With the advent of new technology, the circuitry lines within the IC chip are getting more and more higher in density. Miniaturisation of IC chips has forced many IC manufacturers to go to and beyond deep-sub-micron technology. The present IC technology still stands at less than 0.35 micron. But in...
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| Format: | Research Report |
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2008
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| Online Access: | http://hdl.handle.net/10356/7001 |