Design evaluation of microelectronics devices using focused ion beam technology
With the advent of new technology, the circuitry lines within the IC chip are getting more and more higher in density. Miniaturisation of IC chips has forced many IC manufacturers to go to and beyond deep-sub-micron technology. The present IC technology still stands at less than 0.35 micron. But in...
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| Format: | Research Report |
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2008
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| Online Access: | http://hdl.handle.net/10356/7001 |
| _version_ | 1826119831329439744 |
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| author | Yeo, Swee Hock. |
| author2 | School of Mechanical and Aerospace Engineering |
| author_facet | School of Mechanical and Aerospace Engineering Yeo, Swee Hock. |
| author_sort | Yeo, Swee Hock. |
| collection | NTU |
| description | With the advent of new technology, the circuitry lines within the IC chip are getting more and more higher in density. Miniaturisation of IC chips has forced many IC manufacturers to go to and beyond deep-sub-micron technology. The present IC technology still stands at less than 0.35 micron. But in 2003 or in 2004, the technology will move towards less than 0.1 micron. In fact, some technologically advanced countries like USA are already working on less than 0.13 micron technology. In anticipation, many of the IC manufacturers are preparing for this imminent change that will inevitably take place in the near future. To be able to achieve the above, critical tools (e.g. focus-ion beam) and the relevant expertise and competencies have to be developed. In short, local technology support must be put in place. This is timely as we move forward to 2004, semiconductor industry will be a major pillar in Singapore's technological and industrial base. |
| first_indexed | 2024-10-01T05:06:33Z |
| format | Research Report |
| id | ntu-10356/7001 |
| institution | Nanyang Technological University |
| last_indexed | 2024-10-01T05:06:33Z |
| publishDate | 2008 |
| record_format | dspace |
| spelling | ntu-10356/70012023-03-04T18:07:40Z Design evaluation of microelectronics devices using focused ion beam technology Yeo, Swee Hock. School of Mechanical and Aerospace Engineering DRNTU::Engineering::Electrical and electronic engineering::Microelectronics With the advent of new technology, the circuitry lines within the IC chip are getting more and more higher in density. Miniaturisation of IC chips has forced many IC manufacturers to go to and beyond deep-sub-micron technology. The present IC technology still stands at less than 0.35 micron. But in 2003 or in 2004, the technology will move towards less than 0.1 micron. In fact, some technologically advanced countries like USA are already working on less than 0.13 micron technology. In anticipation, many of the IC manufacturers are preparing for this imminent change that will inevitably take place in the near future. To be able to achieve the above, critical tools (e.g. focus-ion beam) and the relevant expertise and competencies have to be developed. In short, local technology support must be put in place. This is timely as we move forward to 2004, semiconductor industry will be a major pillar in Singapore's technological and industrial base. 2008-09-18T05:58:47Z 2008-09-18T05:58:47Z 2005 2005 Research Report http://hdl.handle.net/10356/7001 Nanyang Technological University application/pdf |
| spellingShingle | DRNTU::Engineering::Electrical and electronic engineering::Microelectronics Yeo, Swee Hock. Design evaluation of microelectronics devices using focused ion beam technology |
| title | Design evaluation of microelectronics devices using focused ion beam technology |
| title_full | Design evaluation of microelectronics devices using focused ion beam technology |
| title_fullStr | Design evaluation of microelectronics devices using focused ion beam technology |
| title_full_unstemmed | Design evaluation of microelectronics devices using focused ion beam technology |
| title_short | Design evaluation of microelectronics devices using focused ion beam technology |
| title_sort | design evaluation of microelectronics devices using focused ion beam technology |
| topic | DRNTU::Engineering::Electrical and electronic engineering::Microelectronics |
| url | http://hdl.handle.net/10356/7001 |
| work_keys_str_mv | AT yeosweehock designevaluationofmicroelectronicsdevicesusingfocusedionbeamtechnology |