Optimization of thermal imaging techniques in failure analysis

Lock-in thermography (LIT) has been gaining more attention from the research community for non-destructive evaluation of integrated circuits (IC) and localization of thermal active electrical defects in microelectronics and circuit reliability research. Thermal imaging is considered to be the standa...

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Bibliographic Details
Main Author: Sidambararajan, Preethy Sudhan
Other Authors: Zhou Xing
Format: Thesis
Language:English
Published: 2019
Subjects:
Online Access:http://hdl.handle.net/10356/76873
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author Sidambararajan, Preethy Sudhan
author2 Zhou Xing
author_facet Zhou Xing
Sidambararajan, Preethy Sudhan
author_sort Sidambararajan, Preethy Sudhan
collection NTU
description Lock-in thermography (LIT) has been gaining more attention from the research community for non-destructive evaluation of integrated circuits (IC) and localization of thermal active electrical defects in microelectronics and circuit reliability research. Thermal imaging is considered to be the standard technology in the field of IC failure analysis. This thesis presents the following: 1) optimization scheme for thermal imaging techniques is proposed to calibrate with the LIT and identify the root cause of the failure in IC packages, 2) ultra-violet (UV) thermal imaging technique is introduced with LIT for failure analysis. Experiments are conducted under real-world environment. The results show that the proposed optimization techniques improves both the validation time and accuracy of the conventional thermal imaging techniques for the failure analysis. Furthermore, an investigation is carried out to identify the potential of UV thermal imaging LIT for the failure analysis.
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spelling ntu-10356/768732023-07-04T16:15:14Z Optimization of thermal imaging techniques in failure analysis Sidambararajan, Preethy Sudhan Zhou Xing School of Electrical and Electronic Engineering Technical University of Munich DRNTU::Engineering::Electrical and electronic engineering Lock-in thermography (LIT) has been gaining more attention from the research community for non-destructive evaluation of integrated circuits (IC) and localization of thermal active electrical defects in microelectronics and circuit reliability research. Thermal imaging is considered to be the standard technology in the field of IC failure analysis. This thesis presents the following: 1) optimization scheme for thermal imaging techniques is proposed to calibrate with the LIT and identify the root cause of the failure in IC packages, 2) ultra-violet (UV) thermal imaging technique is introduced with LIT for failure analysis. Experiments are conducted under real-world environment. The results show that the proposed optimization techniques improves both the validation time and accuracy of the conventional thermal imaging techniques for the failure analysis. Furthermore, an investigation is carried out to identify the potential of UV thermal imaging LIT for the failure analysis. Master of Science (Green Electronics) 2019-04-20T10:44:30Z 2019-04-20T10:44:30Z 2019 Thesis http://hdl.handle.net/10356/76873 en 76 p. application/pdf
spellingShingle DRNTU::Engineering::Electrical and electronic engineering
Sidambararajan, Preethy Sudhan
Optimization of thermal imaging techniques in failure analysis
title Optimization of thermal imaging techniques in failure analysis
title_full Optimization of thermal imaging techniques in failure analysis
title_fullStr Optimization of thermal imaging techniques in failure analysis
title_full_unstemmed Optimization of thermal imaging techniques in failure analysis
title_short Optimization of thermal imaging techniques in failure analysis
title_sort optimization of thermal imaging techniques in failure analysis
topic DRNTU::Engineering::Electrical and electronic engineering
url http://hdl.handle.net/10356/76873
work_keys_str_mv AT sidambararajanpreethysudhan optimizationofthermalimagingtechniquesinfailureanalysis