Reconfigurable phase-change photomask for grayscale photolithography

Reconfigurable phase-change photomask for grayscale photolithography

We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-cha...

Full description

Bibliographic Details
Main Authors: Wang, Q., Yuan, Guanghui, Kiang, K. S., Sun, K., Gholipour, B., Rogers, E. T. F., Huang, K., Ang, S. S., Zheludev, Nikolay I., Teng, J. H.
Other Authors: School of Physical and Mathematical Sciences
Format: Journal Article
Language:English
Published: 2019
Subjects:
Semiconductors
Femtosecond Lasers
DRNTU::Science::Physics
Online Access:https://hdl.handle.net/10356/81274
http://hdl.handle.net/10220/47486

Internet

https://hdl.handle.net/10356/81274
http://hdl.handle.net/10220/47486

Similar Items