Reconfigurable phase-change photomask for grayscale photolithography
We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-cha...
| Main Authors: | , , , , , , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2019
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/81274 http://hdl.handle.net/10220/47486 |
| _version_ | 1826129885865705472 |
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| author | Wang, Q. Yuan, Guanghui Kiang, K. S. Sun, K. Gholipour, B. Rogers, E. T. F. Huang, K. Ang, S. S. Zheludev, Nikolay I. Teng, J. H. |
| author2 | School of Physical and Mathematical Sciences |
| author_facet | School of Physical and Mathematical Sciences Wang, Q. Yuan, Guanghui Kiang, K. S. Sun, K. Gholipour, B. Rogers, E. T. F. Huang, K. Ang, S. S. Zheludev, Nikolay I. Teng, J. H. |
| author_sort | Wang, Q. |
| collection | NTU |
| description | We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique. |
| first_indexed | 2024-10-01T07:47:51Z |
| format | Journal Article |
| id | ntu-10356/81274 |
| institution | Nanyang Technological University |
| language | English |
| last_indexed | 2024-10-01T07:47:51Z |
| publishDate | 2019 |
| record_format | dspace |
| spelling | ntu-10356/812742023-02-28T19:26:08Z Reconfigurable phase-change photomask for grayscale photolithography Wang, Q. Yuan, Guanghui Kiang, K. S. Sun, K. Gholipour, B. Rogers, E. T. F. Huang, K. Ang, S. S. Zheludev, Nikolay I. Teng, J. H. School of Physical and Mathematical Sciences The Photonics Institute Centre for Disruptive Photonic Technologies (CDPT) Semiconductors Femtosecond Lasers DRNTU::Science::Physics We demonstrate a grayscale photolithography technique which uses a thin phase-change film as a photomask to locally control the exposure dose and allows three-dimensional (3D) sculpting photoresist for the manufacture of 3D structures. Unlike traditional photomasks, the transmission of the phase-change material photomask can be set to an arbitrary gray level with submicron lateral resolution, and the mask pattern can be optically reconfigured on demand, by inducing a refractive-index-changing phase-transition with femtosecond laser pulses. We show a spiral phase plate and a phase-type super-oscillatory lens fabricated on Si wafers to demonstrate the range of applications that can be addressed with this technique. ASTAR (Agency for Sci., Tech. and Research, S’pore) MOE (Min. of Education, S’pore) Published version 2019-01-16T04:57:31Z 2019-12-06T14:27:08Z 2019-01-16T04:57:31Z 2019-12-06T14:27:08Z 2017 Journal Article Wang, Q., Yuan, G., Kiang, K. S., Sun, K., Gholipour, B., Rogers, E. T. F., ... Teng, J. H. (2017). Reconfigurable phase-change photomask for grayscale photolithography. Applied Physics Letters, 110(20), 201110-. doi:10.1063/1.4983198 0003-6951 https://hdl.handle.net/10356/81274 http://hdl.handle.net/10220/47486 10.1063/1.4983198 en Applied Physics Letters © 2017 American Institute of Physics. All rights reserved. This paper was published in Applied Physics Letters and is made available with permission of American Institute of Physics. 5 p. application/pdf |
| spellingShingle | Semiconductors Femtosecond Lasers DRNTU::Science::Physics Wang, Q. Yuan, Guanghui Kiang, K. S. Sun, K. Gholipour, B. Rogers, E. T. F. Huang, K. Ang, S. S. Zheludev, Nikolay I. Teng, J. H. Reconfigurable phase-change photomask for grayscale photolithography |
| title | Reconfigurable phase-change photomask for grayscale photolithography |
| title_full | Reconfigurable phase-change photomask for grayscale photolithography |
| title_fullStr | Reconfigurable phase-change photomask for grayscale photolithography |
| title_full_unstemmed | Reconfigurable phase-change photomask for grayscale photolithography |
| title_short | Reconfigurable phase-change photomask for grayscale photolithography |
| title_sort | reconfigurable phase change photomask for grayscale photolithography |
| topic | Semiconductors Femtosecond Lasers DRNTU::Science::Physics |
| url | https://hdl.handle.net/10356/81274 http://hdl.handle.net/10220/47486 |
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