Ferroelectricity emerging in strained (111)-textured ZrO2 thin films

(Anti-)ferroelectricity in complementary metal-oxide-semiconductor (CMOS)-compatible binary oxides have attracted considerable research interest recently. Here, we show that by using substrate-induced strain, the orthorhombic phase and the desired ferroelectricity could be achieved in ZrO2thin films...

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Main Authors: Fan, Zhen, Deng, Jinyu, Wang, Jingxian, Liu, Ziyan, Yang, Ping, Xiao, Juanxiu, Yan, Xiaobing, Dong, Zhili, Wang, John, Chen, Jingsheng
Other Authors: School of Materials Science & Engineering
Format: Journal Article
Language:English
Published: 2016
Subjects:
Online Access:https://hdl.handle.net/10356/82422
http://hdl.handle.net/10220/40010
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author Fan, Zhen
Deng, Jinyu
Wang, Jingxian
Liu, Ziyan
Yang, Ping
Xiao, Juanxiu
Yan, Xiaobing
Dong, Zhili
Wang, John
Chen, Jingsheng
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Fan, Zhen
Deng, Jinyu
Wang, Jingxian
Liu, Ziyan
Yang, Ping
Xiao, Juanxiu
Yan, Xiaobing
Dong, Zhili
Wang, John
Chen, Jingsheng
author_sort Fan, Zhen
collection NTU
description (Anti-)ferroelectricity in complementary metal-oxide-semiconductor (CMOS)-compatible binary oxides have attracted considerable research interest recently. Here, we show that by using substrate-induced strain, the orthorhombic phase and the desired ferroelectricity could be achieved in ZrO2thin films. Our theoretical analyses suggest that the strain imposed on the ZrO2 (111) film by the TiN/MgO (001) substrate would energetically favor the tetragonal (t) and orthorhombic (o) phases over the monoclinic (m) phase of ZrO2, and the compressive strain along certain ⟨11-2⟩ directions may further stabilize the o-phase. Experimentally ZrO2thin films are sputtered onto the MgO (001) substrates buffered by epitaxial TiN layers. ZrO2thin films exhibit t- and o-phases, which are highly (111)-textured and strained, as evidenced by X-ray diffraction and transmission electron microscopy. Both polarization-electric field (P-E) loops and corresponding current responses to voltage stimulations measured with appropriate applied fields reveal the ferroelectric sub-loop behavior of the ZrO2films at certain thicknesses, confirming that the ferroelectric o-phase has been developed in the strained (111)-textured ZrO2films. However, further increasing the applied field leads to the disappearance of ferroelectric hysteresis, the possible reasons of which are discussed.
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spelling ntu-10356/824222023-07-14T15:49:03Z Ferroelectricity emerging in strained (111)-textured ZrO2 thin films Fan, Zhen Deng, Jinyu Wang, Jingxian Liu, Ziyan Yang, Ping Xiao, Juanxiu Yan, Xiaobing Dong, Zhili Wang, John Chen, Jingsheng School of Materials Science & Engineering Ferroelectric thin films (Anti-)ferroelectricity in complementary metal-oxide-semiconductor (CMOS)-compatible binary oxides have attracted considerable research interest recently. Here, we show that by using substrate-induced strain, the orthorhombic phase and the desired ferroelectricity could be achieved in ZrO2thin films. Our theoretical analyses suggest that the strain imposed on the ZrO2 (111) film by the TiN/MgO (001) substrate would energetically favor the tetragonal (t) and orthorhombic (o) phases over the monoclinic (m) phase of ZrO2, and the compressive strain along certain ⟨11-2⟩ directions may further stabilize the o-phase. Experimentally ZrO2thin films are sputtered onto the MgO (001) substrates buffered by epitaxial TiN layers. ZrO2thin films exhibit t- and o-phases, which are highly (111)-textured and strained, as evidenced by X-ray diffraction and transmission electron microscopy. Both polarization-electric field (P-E) loops and corresponding current responses to voltage stimulations measured with appropriate applied fields reveal the ferroelectric sub-loop behavior of the ZrO2films at certain thicknesses, confirming that the ferroelectric o-phase has been developed in the strained (111)-textured ZrO2films. However, further increasing the applied field leads to the disappearance of ferroelectric hysteresis, the possible reasons of which are discussed. NRF (Natl Research Foundation, S’pore) Published version 2016-02-19T07:03:07Z 2019-12-06T14:55:17Z 2016-02-19T07:03:07Z 2019-12-06T14:55:17Z 2016 Journal Article Fan, Z., Deng, J., Wang, J., Liu, Z., Yang, P., Xiao, J., et al. (2016). Ferroelectricity emerging in strained (111)-textured ZrO2 thin films. Applied Physics Letters, 108(1), 012906-. 0003-6951 https://hdl.handle.net/10356/82422 http://hdl.handle.net/10220/40010 10.1063/1.4939660 en Applied Physics Letters © 2016 AIP Publishing LLC. This paper was published in Applied Physics Letters and is made available as an electronic reprint (preprint) with permission of AIP Publishing LLC. The published version is available at: [http://dx.doi.org/10.1063/1.4939660]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. 5 p. application/pdf
spellingShingle Ferroelectric thin films
Fan, Zhen
Deng, Jinyu
Wang, Jingxian
Liu, Ziyan
Yang, Ping
Xiao, Juanxiu
Yan, Xiaobing
Dong, Zhili
Wang, John
Chen, Jingsheng
Ferroelectricity emerging in strained (111)-textured ZrO2 thin films
title Ferroelectricity emerging in strained (111)-textured ZrO2 thin films
title_full Ferroelectricity emerging in strained (111)-textured ZrO2 thin films
title_fullStr Ferroelectricity emerging in strained (111)-textured ZrO2 thin films
title_full_unstemmed Ferroelectricity emerging in strained (111)-textured ZrO2 thin films
title_short Ferroelectricity emerging in strained (111)-textured ZrO2 thin films
title_sort ferroelectricity emerging in strained 111 textured zro2 thin films
topic Ferroelectric thin films
url https://hdl.handle.net/10356/82422
http://hdl.handle.net/10220/40010
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