A Simple Method for the Growth of Very Smooth and Ultra-Thin GaSb Films on GaAs (111) Substrate by MOCVD

A Simple Method for the Growth of Very Smooth and Ultra-Thin GaSb Films on GaAs (111) Substrate by MOCVD

We present a simple thermal treatment with the antimony source for the metal–organic chemical vapor deposition of thin GaSb films on GaAs (111) substrates for the first time. The properties of the as-grown GaSb films are systematically analyzed by scanning electron microscopy, atomic force microscop...

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Bibliographic Details
Main Authors: Ni, Pei-Nan, Tong, Jin-Chao, Tobing, Landobasa Y. M., Qiu, Shu-Peng, Xu, Zheng-Ji, Tang, Xiaohong, Zhang, Dao Hua
Other Authors: School of Electrical and Electronic Engineering
Format: Journal Article
Language:English
Published: 2017
Subjects:
GaSb on GaAs
Metal–organic chemical vapor deposition (MOCVD)
Online Access:https://hdl.handle.net/10356/83451
http://hdl.handle.net/10220/42611

Internet

https://hdl.handle.net/10356/83451
http://hdl.handle.net/10220/42611

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