A computational design framework for two-layered elastic stamps in nanoimprint lithography and microcontact printing
Mechanical micro- and nano-patterning processes rely on engineering the interactions between a stamp and a substrate to accommodate surface roughness and particle defects while retaining the geometric integrity of printed features. We introduce a set of algorithms for rapidly simulating the stamp-su...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2019
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/85324 http://hdl.handle.net/10220/48272 |