Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference

In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939.

書目詳細資料
Main Authors: Murukeshan, V. M., Sathiyamoorthy, K., Sidharthan Raghuraman.
其他作者: School of Mechanical and Aerospace Engineering
格式: Journal Article
語言:English
出版: 2013
主題:
在線閱讀:https://hdl.handle.net/10356/85515
http://hdl.handle.net/10220/13729