Sub-60 nm periodic grating feature patterning by immersion based 364 nm laser interference
In this paper, we report a methodology to fabricate high resolution periodic grating features using high index prism based interferometer and i-line laser source. Features with sub-60 nm half pitch size were fabricated on i-line resist in an immersion medium using a prism of high index 1.939.
| Main Authors: | , , |
|---|---|
| 其他作者: | |
| 格式: | Journal Article |
| 語言: | English |
| 出版: |
2013
|
| 主題: | |
| 在線閱讀: | https://hdl.handle.net/10356/85515 http://hdl.handle.net/10220/13729 |