Sensitivity analysis of coupled interconnects for RFIC applications
This paper investigates the sensitivity of on-wafer coupled interconnects to the Si CMOS process parameters. Experiments are conducted to emulate state-of-the-art and future technologies. Some important parameters characterizing the coupled interconnects have been examined. The influence of the proc...
Main Authors: | , , , , |
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Other Authors: | |
Format: | Journal Article |
Language: | English |
Published: |
2009
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/91414 http://hdl.handle.net/10220/4665 |