Atomic stacking configurations in atomic layer deposited TiN films

Atomic stacking configurations in atomic layer deposited TiN films

Study on the atomic stacking configurations and grain boundary structures of ultrathin nanocrystalline TiN films deposited by the atomic layer deposition technique reveals t...

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Bibliographic Details
Main Authors: Park, H. S., Lim, B. K., Liang, M. H., Sun, C. Q., Gao, W., Li, Sean, Dong, Zhili
Other Authors: School of Materials Science & Engineering
Format: Journal Article
Language:English
Published: 2012
Subjects:
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Online Access:https://hdl.handle.net/10356/94085
http://hdl.handle.net/10220/7437

Internet

https://hdl.handle.net/10356/94085
http://hdl.handle.net/10220/7437

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