Formation and characterization of magnetron sputtered Ta–Si–N–O thin films

Formation and characterization of magnetron sputtered Ta–Si–N–O thin films

Tantalum silicon nitride films have good potential to be used as hard coatings and diffusion barriers. In this work, films with different composition were deposited using a magnetron sputter under varying nitrogen flow rates. The composition, microstructure, thermal stability and electrical resis...

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Bibliographic Details
Main Authors: Xu, S., Chen, Z., Yan, H., Li, L., Ho, F. Y., Liang, M. H., Pan, J. S.
Other Authors: School of Materials Science & Engineering
Format: Journal Article
Language:English
Published: 2012
Subjects:
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Online Access:https://hdl.handle.net/10356/94102
http://hdl.handle.net/10220/8204

Internet

https://hdl.handle.net/10356/94102
http://hdl.handle.net/10220/8204

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