Formation and characterization of magnetron sputtered Ta–Si–N–O thin films

Formation and characterization of magnetron sputtered Ta–Si–N–O thin films

Tantalum silicon nitride films have good potential to be used as hard coatings and diffusion barriers. In this work, films with different composition were deposited using a magnetron sputter under varying nitrogen flow rates. The composition, microstructure, thermal stability and electrical resis...

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Bibliografiska uppgifter
Huvudupphovsmän: Xu, S., Chen, Z., Yan, H., Li, L., Ho, F. Y., Liang, M. H., Pan, J. S.
Övriga upphovsmän: School of Materials Science & Engineering
Materialtyp: Journal Article
Språk:English
Publicerad: 2012
Ämnen:
DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
Länkar:https://hdl.handle.net/10356/94102
http://hdl.handle.net/10220/8204

Internet

https://hdl.handle.net/10356/94102
http://hdl.handle.net/10220/8204

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