Formation and characterization of magnetron sputtered Ta–Si–N–O thin films
Tantalum silicon nitride films have good potential to be used as hard coatings and diffusion barriers. In this work, films with different composition were deposited using a magnetron sputter under varying nitrogen flow rates. The composition, microstructure, thermal stability and electrical resis...
| Main Authors: | , , , , , , |
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| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2012
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/94102 http://hdl.handle.net/10220/8204 |