Intermetallic compound formation between Sn–3.5Ag solder and Ni-based metallization during liquid state reaction
Ni and its alloys possess a lower reaction rate with Sn than Cu and Cu alloys. Ni-based under bump metallization (UBM) therefore receives considerable attention from the microelectronic packaging industry for the popular flipchip applications. In this work, we study the interfacial reaction of elect...
Main Authors: | He, Min, Lau, Wee Hua, Qi, Guojun, Chen, Zhong |
---|---|
Other Authors: | School of Materials Science & Engineering |
Format: | Journal Article |
Language: | English |
Published: |
2012
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/94359 http://hdl.handle.net/10220/8208 |
Similar Items
-
Interfacial study of electroless Ni-Sn-P plating and Sn-3.5Ag solder after multiple reflows
by: Sumboja, Afriyanti.
Published: (2009) -
Effect of Ni–P thickness on solid-state interfacial reactions between Sn–3.5Ag solder and electroless Ni–P metallization on Cu substrate
by: Kumar, Aditya, et al.
Published: (2013) -
Fracture toughness of Cu-Sn intermetallic thin films
by: Li, M., et al.
Published: (2012) -
Effects of interfacial reactions and electromigration on the Cu/electroless Ni-P/Sn-3.5Ag solder joint strength
by: Aditya Kumar
Published: (2008) -
Fracture properties of Sn-37Pb and Sn-3.5Ag solder joints
by: Siow, Kim Shyong.
Published: (2008)