Textured Ni(Pt) germanosilicide formation on a condensed Si1-xGex/Si substrate
A study of Ni and Ni(Pt) germanosilicidation on a condensed Si1−xGex/Si substrate was performed. The partial relaxation of the condensed SiGe layer resulted in an improvement in the morphological stability of the germanosilicide through the alleviation of compressive stress. Pt alloying to th...
| Główni autorzy: | , , , , |
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| Kolejni autorzy: | |
| Format: | Journal Article |
| Język: | English |
| Wydane: |
2012
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| Hasła przedmiotowe: | |
| Dostęp online: | https://hdl.handle.net/10356/95013 http://hdl.handle.net/10220/8004 |