High-throughput dip-pen-nanolithography-based fabrication of Si nanostructures
Si nanostructures: A new method for fabricating large-area Si nanostructures in a high-throughput fashion has been demonstrated. The procedure is based upon dip-pen nanolithography in combination with wet-chemical etching and reactive ion etching. Multipen techniques have been demonstrated for the f...
| Autori principali: | , , , , , |
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| Altri autori: | |
| Natura: | Journal Article |
| Lingua: | English |
| Pubblicazione: |
2012
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| Soggetti: | |
| Accesso online: | https://hdl.handle.net/10356/95378 http://hdl.handle.net/10220/8613 |