Effect of oxygen concentration on the thermal stability of magnetron sputtered amorphous Ta–Ni thin films
The effect of oxygen concentration on the thermal stability of amorphous Ta–Ni thin film alloy is studied in this work. The films were deposited on Si substrates by co-sputtering of Ta and Ni targets. The oxygen concentration in the Ta–Ni films was controlled by applying radio frequency (RF) substra...
| Main Authors: | , , , , |
|---|---|
| Other Authors: | |
| Format: | Journal Article |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/96368 http://hdl.handle.net/10220/10282 |