4H-SiC wafers studied by X-ray absorption and Raman scattering

Synchrotron radiation X-ray absorption and UV 325 nm excitation Raman scattering- photoluminescence (PL) have been employed to investigate a series of 4H-SiC wafers, including bulk, epitaxial single or multiple layer structures by chemical vapor deposition. Significant results on the atomic bonding...

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Main Authors: Mendis, Suwan P., Xu, Qiang, Sun, Hua Yang, Chen, Cheng, Jang, Ling-Yun, E. Rusli, Tin, Chin Che, Qiu, Zhi Ren, Wu, Zhengyun, Liu, Chee Wee, Feng, Zhe Chuan
Other Authors: School of Electrical and Electronic Engineering
Format: Conference Paper
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/97866
http://hdl.handle.net/10220/11147
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author Mendis, Suwan P.
Xu, Qiang
Sun, Hua Yang
Chen, Cheng
Jang, Ling-Yun
E. Rusli
Tin, Chin Che
Qiu, Zhi Ren
Wu, Zhengyun
Liu, Chee Wee
Feng, Zhe Chuan
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Mendis, Suwan P.
Xu, Qiang
Sun, Hua Yang
Chen, Cheng
Jang, Ling-Yun
E. Rusli
Tin, Chin Che
Qiu, Zhi Ren
Wu, Zhengyun
Liu, Chee Wee
Feng, Zhe Chuan
author_sort Mendis, Suwan P.
collection NTU
description Synchrotron radiation X-ray absorption and UV 325 nm excitation Raman scattering- photoluminescence (PL) have been employed to investigate a series of 4H-SiC wafers, including bulk, epitaxial single or multiple layer structures by chemical vapor deposition. Significant results on the atomic bonding and PL-Raman properties are obtained from these comparative studies.
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spelling ntu-10356/978662020-03-07T13:24:48Z 4H-SiC wafers studied by X-ray absorption and Raman scattering Mendis, Suwan P. Xu, Qiang Sun, Hua Yang Chen, Cheng Jang, Ling-Yun E. Rusli Tin, Chin Che Qiu, Zhi Ren Wu, Zhengyun Liu, Chee Wee Feng, Zhe Chuan School of Electrical and Electronic Engineering Silicon Carbide and Related Materials (2011) DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials Synchrotron radiation X-ray absorption and UV 325 nm excitation Raman scattering- photoluminescence (PL) have been employed to investigate a series of 4H-SiC wafers, including bulk, epitaxial single or multiple layer structures by chemical vapor deposition. Significant results on the atomic bonding and PL-Raman properties are obtained from these comparative studies. 2013-07-10T09:05:01Z 2019-12-06T19:47:29Z 2013-07-10T09:05:01Z 2019-12-06T19:47:29Z 2012 2012 Conference Paper https://hdl.handle.net/10356/97866 http://hdl.handle.net/10220/11147 10.4028/www.scientific.net/MSF.717-720.509 en © 2012 Trans Tech Publications, Switzerland.
spellingShingle DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
Mendis, Suwan P.
Xu, Qiang
Sun, Hua Yang
Chen, Cheng
Jang, Ling-Yun
E. Rusli
Tin, Chin Che
Qiu, Zhi Ren
Wu, Zhengyun
Liu, Chee Wee
Feng, Zhe Chuan
4H-SiC wafers studied by X-ray absorption and Raman scattering
title 4H-SiC wafers studied by X-ray absorption and Raman scattering
title_full 4H-SiC wafers studied by X-ray absorption and Raman scattering
title_fullStr 4H-SiC wafers studied by X-ray absorption and Raman scattering
title_full_unstemmed 4H-SiC wafers studied by X-ray absorption and Raman scattering
title_short 4H-SiC wafers studied by X-ray absorption and Raman scattering
title_sort 4h sic wafers studied by x ray absorption and raman scattering
topic DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
url https://hdl.handle.net/10356/97866
http://hdl.handle.net/10220/11147
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