Effect of IC layout on the reliability of CMOS amplifiers
With shrinking device size and increasing circuit complexity, interconnect reliability has become the main factor that affects the integrated circuit (IC) reliability. Electromigration (EM) is the major failure mechanism for interconnect reliability. However, little research had been done on the eff...
| Main Authors: | , |
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| Format: | Journal Article |
| Language: | English |
| Published: |
2013
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| Subjects: | |
| Online Access: | https://hdl.handle.net/10356/98538 http://hdl.handle.net/10220/11171 |