A low normal force contact using photolithography and Ni-Co electro fine forming technology
This new technology is realized by Photo Resist Lithography and Ni-Co Electro Fine Forming technology, and enables the design of a small contact spring for applications requiring high density, high speed and high durability. The evaluation result proved the capability of Low Normal Force (0.10N-0....
| Päätekijät: | , |
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| Aineistotyyppi: | Proceeding Paper |
| Kieli: | English English |
| Julkaistu: |
2009
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| Aiheet: | |
| Linkit: | http://irep.iium.edu.my/33437/1/A_Low_Normal_Force_Contact_using_Photolithography_and_Ni-Co_Electro_Fine_Forming_Technology.pdf http://irep.iium.edu.my/33437/2/Tech._Paper_Conf._Spring2009_20090515.pdf |