The application of low dose SIMS to surface studies on compound semiconductors
In this thesis secondary ion mass spectrometry is assessed as a surface analysis technique for compound semiconductor surfaces. Two types of surface analysis problems are addressed - the use of SIMS to monitor cleaning of GaAs substrates in UHV for MBE growth and adsorption studies - and the use...
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| Format: | Thesis |
| Language: | English |
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1984
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| Online Access: | https://repository.londonmet.ac.uk/3367/1/350149.pdf |