Saturated and near-diffraction-limited operation of an XUV laser at 23.6 nm

Amplification of spontaneous emission (ASE) at 23.6 nm has been studied in a Ge plasma heated by a 1 TW infrared laser pulse. The exponent of the axial gain reached 21 in a geometry with Fresnel number ≤ 1. Two plasma columns of combined length up to 36 mm were used with an extreme ultraviolet mirro...

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Main Authors: Carillon, A, Chen, H, Dhez, P, Dwivedi, L, Jacoby, J, Jaegle, P, Jamelot, G, Zhang, J, Key, M, Kidd, A, Klisnick, A, Kodama, R, Krishnan, J, Lewis, C, Neely, D, Norreys, P, O'Neill, D, Pert, G, Ramsden, SA, Raucourt, J, Tallents, G, Uhomoibhi, J
Format: Journal article
Language:English
Published: 1992
_version_ 1797051579357986816
author Carillon, A
Chen, H
Dhez, P
Dwivedi, L
Jacoby, J
Jaegle, P
Jamelot, G
Zhang, J
Key, M
Kidd, A
Klisnick, A
Kodama, R
Krishnan, J
Lewis, C
Neely, D
Norreys, P
O'Neill, D
Pert, G
Ramsden, SA
Raucourt, J
Tallents, G
Uhomoibhi, J
author_facet Carillon, A
Chen, H
Dhez, P
Dwivedi, L
Jacoby, J
Jaegle, P
Jamelot, G
Zhang, J
Key, M
Kidd, A
Klisnick, A
Kodama, R
Krishnan, J
Lewis, C
Neely, D
Norreys, P
O'Neill, D
Pert, G
Ramsden, SA
Raucourt, J
Tallents, G
Uhomoibhi, J
author_sort Carillon, A
collection OXFORD
description Amplification of spontaneous emission (ASE) at 23.6 nm has been studied in a Ge plasma heated by a 1 TW infrared laser pulse. The exponent of the axial gain reached 21 in a geometry with Fresnel number ≤ 1. Two plasma columns of combined length up to 36 mm were used with an extreme ultraviolet mirror giving double-pass amplification. Saturation of the ASE output was observed. The beam divergence was about 8× diffraction limited with a brightness estimated at 1014 W cm-2sr-1. The feedback from the mirror was significantly reduced probably by radiation damage from the plasma.
first_indexed 2024-03-06T18:21:31Z
format Journal article
id oxford-uuid:06748233-04ad-459c-9535-3311a5fd5937
institution University of Oxford
language English
last_indexed 2024-03-06T18:21:31Z
publishDate 1992
record_format dspace
spelling oxford-uuid:06748233-04ad-459c-9535-3311a5fd59372022-03-26T09:02:37ZSaturated and near-diffraction-limited operation of an XUV laser at 23.6 nmJournal articlehttp://purl.org/coar/resource_type/c_dcae04bcuuid:06748233-04ad-459c-9535-3311a5fd5937EnglishSymplectic Elements at Oxford1992Carillon, AChen, HDhez, PDwivedi, LJacoby, JJaegle, PJamelot, GZhang, JKey, MKidd, AKlisnick, AKodama, RKrishnan, JLewis, CNeely, DNorreys, PO'Neill, DPert, GRamsden, SARaucourt, JTallents, GUhomoibhi, JAmplification of spontaneous emission (ASE) at 23.6 nm has been studied in a Ge plasma heated by a 1 TW infrared laser pulse. The exponent of the axial gain reached 21 in a geometry with Fresnel number ≤ 1. Two plasma columns of combined length up to 36 mm were used with an extreme ultraviolet mirror giving double-pass amplification. Saturation of the ASE output was observed. The beam divergence was about 8× diffraction limited with a brightness estimated at 1014 W cm-2sr-1. The feedback from the mirror was significantly reduced probably by radiation damage from the plasma.
spellingShingle Carillon, A
Chen, H
Dhez, P
Dwivedi, L
Jacoby, J
Jaegle, P
Jamelot, G
Zhang, J
Key, M
Kidd, A
Klisnick, A
Kodama, R
Krishnan, J
Lewis, C
Neely, D
Norreys, P
O'Neill, D
Pert, G
Ramsden, SA
Raucourt, J
Tallents, G
Uhomoibhi, J
Saturated and near-diffraction-limited operation of an XUV laser at 23.6 nm
title Saturated and near-diffraction-limited operation of an XUV laser at 23.6 nm
title_full Saturated and near-diffraction-limited operation of an XUV laser at 23.6 nm
title_fullStr Saturated and near-diffraction-limited operation of an XUV laser at 23.6 nm
title_full_unstemmed Saturated and near-diffraction-limited operation of an XUV laser at 23.6 nm
title_short Saturated and near-diffraction-limited operation of an XUV laser at 23.6 nm
title_sort saturated and near diffraction limited operation of an xuv laser at 23 6 nm
work_keys_str_mv AT carillona saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT chenh saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT dhezp saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT dwivedil saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT jacobyj saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT jaeglep saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT jamelotg saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT zhangj saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT keym saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT kidda saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT klisnicka saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT kodamar saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT krishnanj saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT lewisc saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT neelyd saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT norreysp saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT oneilld saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT pertg saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT ramsdensa saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT raucourtj saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT tallentsg saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm
AT uhomoibhij saturatedandneardiffractionlimitedoperationofanxuvlaserat236nm