Semiconductor surface etching by halogens: Fundamental steps
The mechanisms underlying the reaction of halogen molecules with Si(100) have been investigated using the surface probes of thermal desorption spectroscopy (TDS) and Auger electron spectroscopy. The formation of a strongly bound monolayer phase followed by a more weakly held silicon halide corrosion...
| Main Authors: | , , |
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| Formato: | Journal article |
| Idioma: | English |
| Publicado: |
1989
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