Improved characterisation of C2 and CH radical number density distributions in a DC arc jet used for diamond chemical vapour deposition
Modelling studies of the plasma chemistry prevailing in CH4/H2/Ar mixtures in a DC arc jet reactor used for diamond chemical vapour deposition are reported, together with complementary new experimental data. Gas temperatures, Tgas, close to the substrate have been determined via analysis of the meas...
| Main Authors: | , , , , , , , |
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| Format: | Journal article |
| Language: | English |
| Published: |
2004
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