Nanodiamond thin films on titanium substrates - Growth and electrochemical properties
A new type of electrically conducting nanosized diamond film deposit is grown on titanium substrates in a microwave plasma chemical vapor deposition process. The deposition process occurs at 80 Torr in a helium atmosphere with only hydrogen (1.95%) and methane (0.73%) admitted and yields a deposit g...
| Հիմնական հեղինակներ: | , , , , |
|---|---|
| Ձևաչափ: | Journal article |
| Լեզու: | English |
| Հրապարակվել է: |
2003
|