Identification of colloidal silica polishing induced contamination in silicon
This paper presents a multiscale characterisation approach, analysing the effect of colloidal silica polishing on crystallographic defects in multicrystalline silicon. Colloidal silica polishing for as little time as 30 min was found to significantly increase the recombination activity of all defect...
| Main Authors: | , , , , |
|---|---|
| Format: | Journal article |
| Language: | English |
| Published: |
Elsevier
2019
|