THE MAGNETORESISTANCE OF SUBMICRON FE WIRES
A novel combination of electron- and ion-beam lithography has been used to prepare Fe gratings with wire widths of 0.5 μm and wire separations in the range 0.5-4 μm from an Fe/GaAs (001) film of thickness 25 nm. With an in-plane magnetic field applied perpendicular to the length of the wires, a hard...
| Κύριοι συγγραφείς: | , , , , , |
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| Μορφή: | Journal article |
| Έκδοση: |
1994
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