Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

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書誌詳細
主要な著者:	Castell, M, Simpson, T, Mitchell, I, Perovic, D, Baribeau, J
フォーマット:	Journal article
出版事項:	1999

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