Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

Pokaż inne wersje (1)

Opis bibliograficzny
Główni autorzy:	Castell, M, Simpson, T, Mitchell, I, Perovic, D, Baribeau, J
Format:	Journal article
Wydane:	1999

Podobne zapisy

Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging
od: Castell, M, i wsp.
Wydane: (1999)

Deactivation and diffusion of boron in ion-implanted silicon: dopant mapping through secondary electron imaging
od: Castell, M, i wsp.
Wydane: (1999)

Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
od: Verena Steckenreiter, i wsp.
Wydane: (2017-03-01)

Plasma immersion ion implantation of boron for ribbon silicon solar cells
od: Derbouz K., i wsp.
Wydane: (2013-09-01)

The Modeling of the Radiation Enhanced Diffusion of Boron in Silicon
od: Gadiyak, G.V., i wsp.
Wydane: (1994-06-01)

Argon Precursor Ion Implantation Used to Activate Boron Atoms in Silicon at Low Temperatures
od: Toshiyuki Sameshima, i wsp.
Wydane: (2020-01-01)

Electronic contribution to secondary electron compositional contrast in the scanning electron microscope
od: Castell, M, i wsp.
Wydane: (1997)

Deactivation of metastable single-crystal silicon hyperdoped with sulfur
od: Krich, Jacob J., i wsp.
Wydane: (2015)

Synthesis and Modification of Boron Nitride nanotubes using ion implantation
od: L.I. Lisema, i wsp.
Wydane: (2024-07-01)

Aging Processes in Films of Iron-Yttrium Garnet Implanted by Boron Ions
od: I. P. Yaremiy, i wsp.
Wydane: (2019-04-01)

THE ELASTIC PROPERTIES OF ION-IMPLANTED SILICON
od: Burnett, P, i wsp.
Wydane: (1986)

Ion implantation in semiconductors : silicon and germanium/
od: Mayer, James W., 1930-, i wsp.
Wydane: (1970)

Mechanical and Structural Properties of Fluorine-Ion-Implanted Boron Suboxide
od: Ronald Machaka, i wsp.
Wydane: (2012-01-01)

MODEL OF BORON CLUSTERING IN SILICON
od: O. I. Velichko
Wydane: (2019-06-01)

Modelling of cylinder deactivation engine [electronic resource] /
od: Mohd. Fadziel Mohamad Nor, 1992-, i wsp.
Wydane: (2015)

Ultrafast Electronic Deactivation Dynamics of Xanthosine Monophosphate
od: Katharina Röttger, i wsp.
Wydane: (2017-01-01)

Hydrides of boron and silicon/
od: 206407 Stock, Alfred Eduard
Wydane: (1933)

Quantitative imaging of semiconductor doping distributions using a scanning electron microscope
od: Perovic, D, i wsp.
Wydane: (1998)

Silicon technologies : ion implantation and thermal treatments /
od: Baudrant, Annie
Wydane: (2011)

Nanoclustering in Silicon Induced by Oxygen Ions Implanted
od: D. Manno, i wsp.
Wydane: (2011-11-01)

Deactivation of catalysts/
od: 312802 Hughes, R.
Wydane: (1984)

Catalyst deactivation/
od: Petersen, Eugene E., i wsp.
Wydane: (1987)

Catalyst deactivation/
od: Delmon, Bernard, i wsp.
Wydane: (1980)

{111} and {311} rod-like defects in silicon ion implanted silicon
od: Chou, C, i wsp.
Wydane: (1996)

{111} defects in 1-MeV-silicon-ion-implanted silicon.
od: Chou, C, i wsp.
Wydane: (1995)

Combined structural and functional imaging reveals cortical deactivations in grapheme-colour synaesthesia
od: Erik eO'Hanlon, i wsp.
Wydane: (2013-10-01)

The role of fluorine-containing ultra-thin layer in controlling boron thermal diffusion into silicon
od: Małgorzata Kalisz, i wsp.
Wydane: (2023-06-01)

Enhancing Hydrogen Diffusion in Silica Matrix by Using Metal Ion Implantation to Improve the Emission Properties of Silicon Nanocrystals
od: J. Bornacelli, i wsp.
Wydane: (2014-01-01)

Evaluation of a clinical method for selective electrode deactivation in cochlear implant programming
od: Sarah E. Warren, i wsp.
Wydane: (2023-03-01)

Patient perceptions of implantable cardioverter-defibrillator deactivation discussions: A qualitative study
od: Jane MacIver, i wsp.
Wydane: (2016-04-01)

Postural stability at activation and deactivation of the cochlear implant in adolescents with late lateral implantations: a quasi-experiment
od: Anna Zwierzchowska, i wsp.
Wydane: (2024-07-01)

Turning the optical properties of microcrystalline diamond films by boron ion implantation and annealing
od: Dan Dai, i wsp.
Wydane: (2024-12-01)

Ion implantation in silicon to facilitate testing of photonic circuits
od: Reed, Graham T., i wsp.
Wydane: (2019)

Ion-implantation and analysis for doped silicon slot waveguides
od: McCallum J. C., i wsp.
Wydane: (2012-10-01)

Influence of Boron Diffusion on Photovoltaic Parameters of n+-p-p+ Silicone Structures and Based Photodetectors
od: Mykola S. Kukurudziak, i wsp.
Wydane: (2024-11-01)

Room-temperature near-infrared electroluminescence from boron-diffused silicon pn junction diodes
od: Si eLi, i wsp.
Wydane: (2015-02-01)

Catalyst deactivation : 1991/
od: Bartholomew, Calvin H., i wsp.
Wydane: (1991)

Deactivation and poisoning of catalysts/
od: Oudar, Jacques, i wsp.
Wydane: (1985)

Interpreting deactivations in neuroimaging
od: Dave J Hayes, i wsp.
Wydane: (2012-02-01)

A new approach in deactivation analysis : effects of coke loading on diffusivity and acidic properties /
od: Abdul Rahman Songip