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Deactivation and diffusion of...
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Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging
Show other versions (1)
Xehetasun bibliografikoak
Egile Nagusiak:
Castell, M
,
Simpson, T
,
Mitchell, I
,
Perovic, D
,
Baribeau, J
Formatua:
Journal article
Argitaratua:
1999
Aleari buruzko argibideak
Deskribapena
Other Versions (1)
Antzeko izenburuak
MARC erregistroa
Antzeko izenburuak
Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging
nork: Castell, M, et al.
Argitaratua: (1999)
Deactivation and diffusion of boron in ion-implanted silicon: dopant mapping through secondary electron imaging
nork: Castell, M, et al.
Argitaratua: (1999)
Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
nork: Verena Steckenreiter, et al.
Argitaratua: (2017-03-01)
Plasma immersion ion implantation of boron for ribbon silicon solar cells
nork: Derbouz K., et al.
Argitaratua: (2013-09-01)
The Modeling of the Radiation Enhanced Diffusion of Boron in Silicon
nork: Gadiyak, G.V., et al.
Argitaratua: (1994-06-01)