Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging

Benzer Materyaller

• Deactivation and diffusion of boron in ion-implanted silicon studied by secondary electron imaging
  Yazar:: Castell, M, ve diğerleri
  Baskı/Yayın Bilgisi: (1999)
• Deactivation and diffusion of boron in ion-implanted silicon: dopant mapping through secondary electron imaging
  Yazar:: Castell, M, ve diğerleri
  Baskı/Yayın Bilgisi: (1999)
• Kinetics of the permanent deactivation of the boron-oxygen complex in crystalline silicon as a function of illumination intensity
  Yazar:: Verena Steckenreiter, ve diğerleri
  Baskı/Yayın Bilgisi: (2017-03-01)
• Plasma immersion ion implantation of boron for ribbon silicon solar cells
  Yazar:: Derbouz K., ve diğerleri
  Baskı/Yayın Bilgisi: (2013-09-01)
• The Modeling of the Radiation Enhanced Diffusion of Boron in Silicon
  Yazar:: Gadiyak, G.V., ve diğerleri
  Baskı/Yayın Bilgisi: (1994-06-01)