CHEMICAL-VAPOR-DEPOSITION OF DIAMOND FROM A NOVEL CAPACITIVELY COUPLED RF PLASMA SOURCE
Capacitively coupled (CC) (r.f.) plasmas offer major advantages over microwave-induced plasmas for the growth of large area homogeneous thin films. However, conventionally designed CC r.f. sources lead, at best, to extremely poor quality material when diamond growth is attempted. The first complete...
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| Format: | Conference item |
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1995
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