Taper-Free and Vertically Oriented Ge Nanowires on Ge/Si Substrates Grown by a Two-Temperature Process

Taper-free and vertically oriented Ge nanowires were grown on Si (111) substrates by chemical vapor deposition with Au nanoparticle catalysts. To achieve vertical nanowire growth on the highly lattice mismatched Si substrate, a thin Ge buffer layer was first deposited, and to achieve taper-free nano...

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Bibliographic Details
Main Authors: Kim, J, Moon, SR, Yoon, H, Jung, J, Kim, Y, Chen, Z, Zou, J, Choi, D, Joyce, H, Gao, Q, Tan, H, Jagadish, C
Format: Journal article
Language:English
Published: 2012