Generation of dislocation glide loops in Czochralski silicon
Critical stresses necessary to generate dislocation glide loops in Czochralski silicon containing oxide precipitates have been investigated. Using three-point bending and etching techniques, it was possible to determine the minimum shear stress required to generate dislocation glide loops from contr...
| Main Authors: | , , , |
|---|---|
| Format: | Conference item |
| Published: |
2002
|