Generation of dislocation glide loops in Czochralski silicon

Critical stresses necessary to generate dislocation glide loops in Czochralski silicon containing oxide precipitates have been investigated. Using three-point bending and etching techniques, it was possible to determine the minimum shear stress required to generate dislocation glide loops from contr...

Szczegółowa specyfikacja

Opis bibliograficzny
Główni autorzy: Giannattasio, A, Senkader, S, Falster, R, Wilshaw, P
Format: Conference item
Wydane: 2002