Generation of dislocation glide loops in Czochralski silicon
Critical stresses necessary to generate dislocation glide loops in Czochralski silicon containing oxide precipitates have been investigated. Using three-point bending and etching techniques, it was possible to determine the minimum shear stress required to generate dislocation glide loops from contr...
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| 格式: | Conference item |
| 出版: |
2002
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