Measurement of C-2 radical density in microwave methane/hydrogen plasma used for nanocrystalline diamond film formation
C2 radical density in a conventional microwave plasma-enhanced chemical vapor deposition (MWPCVD) with CH4/H2 mixture was measured using absorption spectroscopy. At the typical growth conditions for MWPCVD used for nanocrystalline diamond formation, C2 radical density in the plasma was of the order...
| Main Authors: | , , , , |
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| Format: | Conference item |
| Published: |
2003
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