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TiSix as a new embedded materi...
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TiSix as a new embedded material for attenuated phase shift mask
Manylion Llyfryddiaeth
Prif Awduron:
Loong, W
,
Chen, T
,
Shy, S
,
Tseng, J
,
Lin, R
Fformat:
Conference item
Cyhoeddwyd:
1996
Daliadau
Disgrifiad
Eitemau Tebyg
Dangos Staff
Disgrifiad
Crynodeb:
Eitemau Tebyg
Additional Siconi™ pre-clean for reliable TiSix contacts in advanced imager technologies
gan: M. Grégoire, et al.
Cyhoeddwyd: (2019-03-01)
The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation
gan: Indykiewicz Kornelia, et al.
Cyhoeddwyd: (2013-02-01)
Application of phase shift masking to sub-0.13 micron lithography
gan: Koo, Chee Kiong.
Cyhoeddwyd: (2008)
Application of phase shift masking to sub-micron contact level lithography
gan: Choo, Lay Cheng.
Cyhoeddwyd: (2008)
Proximal Algorithms for Discrete-Level Phase-Shifting Mask Design with Application to Optogenetics
gan: Dimitris Ampeliotis, et al.
Cyhoeddwyd: (2021-10-01)