TiSix as a new embedded material for attenuated phase shift mask

Lignende værker

• Additional Siconi™ pre-clean for reliable TiSix contacts in advanced imager technologies
  af: M. Grégoire, et al.
  Udgivet: (2019-03-01)
• The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation
  af: Indykiewicz Kornelia, et al.
  Udgivet: (2013-02-01)
• Application of phase shift masking to sub-0.13 micron lithography
  af: Koo, Chee Kiong.
  Udgivet: (2008)
• Application of phase shift masking to sub-micron contact level lithography
  af: Choo, Lay Cheng.
  Udgivet: (2008)
• Proximal Algorithms for Discrete-Level Phase-Shifting Mask Design with Application to Optogenetics
  af: Dimitris Ampeliotis, et al.
  Udgivet: (2021-10-01)