TiSix as a new embedded material for attenuated phase shift mask

Míreanna comhchosúla

• Additional Siconi™ pre-clean for reliable TiSix contacts in advanced imager technologies
  de réir: M. Grégoire, et al.
  Foilsithe / Cruthaithe: (2019-03-01)
• The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation
  de réir: Indykiewicz Kornelia, et al.
  Foilsithe / Cruthaithe: (2013-02-01)
• Application of phase shift masking to sub-0.13 micron lithography
  de réir: Koo, Chee Kiong.
  Foilsithe / Cruthaithe: (2008)
• Application of phase shift masking to sub-micron contact level lithography
  de réir: Choo, Lay Cheng.
  Foilsithe / Cruthaithe: (2008)
• Proximal Algorithms for Discrete-Level Phase-Shifting Mask Design with Application to Optogenetics
  de réir: Dimitris Ampeliotis, et al.
  Foilsithe / Cruthaithe: (2021-10-01)