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TiSix as a new embedded materi...
Čujuhandieđut
Deakstadieđáhus
Sádde šleađgaboasttain
Čálit
Doalvvo čujuhusa
Doalvun: RefWorks
Doalvun: EndNoteWeb
Doalvun: EndNote
Bissovaš liŋka
TiSix as a new embedded material for attenuated phase shift mask
Bibliográfalaš dieđut
Váldodahkkit:
Loong, W
,
Chen, T
,
Shy, S
,
Tseng, J
,
Lin, R
Materiálatiipa:
Conference item
Almmustuhtton:
1996
Oažžasuvvandieđut
Govvádus
Geahča maid
Bargiidšearbma
Govvádus
Čoahkkáigeassu:
Geahča maid
Additional Siconi™ pre-clean for reliable TiSix contacts in advanced imager technologies
Dahkki: M. Grégoire, et al.
Almmustuhtton: (2019-03-01)
The new method of fabrication of submicron structures by optical lithography with mask shifting and mask rotation
Dahkki: Indykiewicz Kornelia, et al.
Almmustuhtton: (2013-02-01)
Application of phase shift masking to sub-0.13 micron lithography
Dahkki: Koo, Chee Kiong.
Almmustuhtton: (2008)
Application of phase shift masking to sub-micron contact level lithography
Dahkki: Choo, Lay Cheng.
Almmustuhtton: (2008)
Proximal Algorithms for Discrete-Level Phase-Shifting Mask Design with Application to Optogenetics
Dahkki: Dimitris Ampeliotis, et al.
Almmustuhtton: (2021-10-01)